Two cameras and AI image recognition track each wafer's path inside a plating tool in real time. When the offset exceeds the limit, a stack light, buzzer and relay trigger instantly, and every event's video and track data are kept.
When a plating tool picks and places wafers, even a small position offset can lead to wafer collisions, breakage or process issues. These problems were usually found only afterwards, and it was hard to tell which move caused them or when.
We installed two cameras inside the tool and used AI image recognition to track the wafer position in real time against a reference path. When the offset exceeds the limit, the system raises an alarm immediately and keeps the full video and track data.
Mock-up for illustration; the actual interface is tailored to each tool and requirement.
Features
- Dual-camera live view: switch between side-by-side and single-camera views; a failed or disconnected camera is clearly flagged instead of looking normal.
- AI wafer position recognition: marks the wafer in real time and calculates its offset from the reference path.
- Real-time alarm: when the offset exceeds the limit, the stack light flashes red, the buzzer sounds and a relay switches; an optional interlock can stop the tool. Operators can mute the buzzer while keeping the alarm, or press Reset to clear everything.
- Event recording and replay: every wafer move is filed by date as a normal or abnormal event, with replay, full-screen and video export, plus switching between live view and replay.
- Track data export: the AI track of every event is stored and can be downloaded as CSV for analysis.
- Maintenance mode: one click pauses detection, the stack light turns yellow and a notice is shown, so maintenance never triggers false alarms.
- Camera calibration: align the camera using a reference-image overlay, adjust the offset tolerance in pixels, and after moving the camera let the AI re-calibrate from a single stationary wafer.
Benefits
- Wafer offsets are detected and alarmed in real time, reducing collision and breakage risk
- Every abnormal event comes with video and track records for root-cause analysis
- Normal and abnormal events are filed by date automatically, making traceability and audits easier
- Pausing detection, tolerance adjustment and camera calibration are handled by on-site staff
Suitable equipment
Beyond plating tools, any wafer-related equipment that needs to monitor wafer position, such as wet process tools and wafer handling or transfer mechanisms, can be fitted based on site conditions.
